Dual injection in a CO₂ microwave plasma : exploring post-plasma quenching with CH₄ and comparison with DRM
Source
Chemical engineering journal - ISSN 1385-8947-521 (2025) p. 1-19
Electron density measurements by Thomson scattering and Stark broadening in nanosecond pulsed CH₄/Ar plasma
Source
Journal of physics: D: applied physics - ISSN 0022-3727-58:37 (2025) p. 1-12
Characterisation of CH₄ nanosecond pulsed plasma across a wide pressure range (0.5–2.0 bar)
Source
Plasma sources science and technology - ISSN 0963-0252-34:7 (2025) p. 1-19
Afterglow quenching in plasma-based dry reforming of methane : a detailed analysis of the post-plasma chemistry via kinetic modelling
Source
RSC sustainability - ISSN 2753-8125-3:3 (2025) p. 1477-1493
Selective catalytic hydrogenation of C₂H₂ from plasma-driven CH₄ coupling without extra heat : mechanistic insights from micro-kinetic modelling and reactor performance
Source
EES catalysis - ISSN 2753-801X-3:3 (2025) p. 475-487